Information card for entry 7052675
| Formula |
C20 H20 N2 O2 Zn |
| Calculated formula |
C20 H20 N2 O2 Zn |
| Title of publication |
Plasma deposited metal Schiff-base compounds as antimicrobials |
| Authors of publication |
Poulter, Neil; Donaldson, Matthew; Mulley, Geraldine; Duque, Luis; Waterfield, Nicholas; Shard, Alex G.; Spencer, Steve; Jenkins, A. Tobias A.; Johnson, Andrew L. |
| Journal of publication |
New Journal of Chemistry |
| Year of publication |
2011 |
| Journal volume |
35 |
| Journal issue |
7 |
| Pages of publication |
1477 |
| a |
9.823 ± 0.0005 Å |
| b |
10.356 ± 0.0006 Å |
| c |
10.74 ± 0.0006 Å |
| α |
63.59 ± 0.003° |
| β |
76.146 ± 0.003° |
| γ |
70.354 ± 0.002° |
| Cell volume |
916.31 ± 0.09 Å3 |
| Cell temperature |
150 ± 2 K |
| Ambient diffraction temperature |
150 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0741 |
| Residual factor for significantly intense reflections |
0.0527 |
| Weighted residual factors for significantly intense reflections |
0.1258 |
| Weighted residual factors for all reflections included in the refinement |
0.14 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.105 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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