Information card for entry 7053869
| Common name |
Compound X |
| Formula |
C18 H20 N2 O |
| Calculated formula |
C18 H20 N2 O |
| SMILES |
c1(ccc(cc1)/C=C/C=N/c1cc(ccc1)CO)N(C)C |
| Title of publication |
Synthesis and crystal structures of a series of Schiff bases: a photo-, solvato- and acidochromic compound |
| Authors of publication |
Jiménez-Sánchez, Arturo; Rodríguez, Mario; Métivier, Rémi; Ramos-Ortíz, Gabriel; Maldonado, Jose Luis; Réboles, Netzahualcoyotl; Farfán, Norberto; Nakatani, Keitaro; Santillan, Rosa |
| Journal of publication |
New Journal of Chemistry |
| Year of publication |
2014 |
| Journal volume |
38 |
| Journal issue |
2 |
| Pages of publication |
730 |
| a |
7.8065 ± 0.0004 Å |
| b |
16.426 ± 0.0014 Å |
| c |
12.1222 ± 0.00119 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
1554.4 ± 0.2 Å3 |
| Cell temperature |
293 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
29 |
| Hermann-Mauguin space group symbol |
P 21 c a |
| Hall space group symbol |
P -2ac 2a |
| Residual factor for all reflections |
0.0459 |
| Residual factor for significantly intense reflections |
0.0369 |
| Weighted residual factors for significantly intense reflections |
0.0968 |
| Weighted residual factors for all reflections included in the refinement |
0.1046 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.968 |
| Diffraction radiation probe |
x-ray |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7053869.html