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Information card for entry 7054870
Preview
| Coordinates | 7054870.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C18 H53 N3 Si6 Te U |
|---|---|
| Calculated formula | C18 H53 N3 Si6 Te U |
| SMILES | [U]1([Te]C[Si](N1[Si](C)(C)C)(C)C)(N([Si](C)(C)C)[Si](C)(C)C)N([Si](C)(C)C)[Si](C)(C)C |
| Title of publication | Reactivity of [U(CH2SiMe2NSiMe3)(NR2)2] (R = SiMe3) with elemental chalcogens: towards a better understanding of chalcogen atom transfer in the actinides |
| Authors of publication | Smiles, Danil E.; Wu, Guang; Hayton, Trevor W. |
| Journal of publication | New J. Chem. |
| Year of publication | 2015 |
| Journal volume | 39 |
| Journal issue | 10 |
| Pages of publication | 7563 |
| a | 8.3155 ± 0.0002 Å |
| b | 11.8276 ± 0.0003 Å |
| c | 17.5749 ± 0.0005 Å |
| α | 88.157 ± 0.001° |
| β | 89.051 ± 0.001° |
| γ | 75.447 ± 0.001° |
| Cell volume | 1672.15 ± 0.08 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0264 |
| Residual factor for significantly intense reflections | 0.0213 |
| Weighted residual factors for significantly intense reflections | 0.0464 |
| Weighted residual factors for all reflections included in the refinement | 0.0479 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.979 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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