Information card for entry 7105248
| Formula |
C21 H26 N4 O5 |
| Calculated formula |
C21 H26 N4 O5 |
| SMILES |
CC(=O)Nc1cc(ccc1)C(=O)N(CC(=O)Nc1cc(ccc1)C(=O)N(C)C)C.O |
| Title of publication |
A hydrogen bonding motif for forming extended assemblies. |
| Authors of publication |
Zhang, Jiahui; Wu, Xiangxiang; Yamato, Kazuhiro; Liu, Futao; Su, Tianyi; Zheng, Chong; He, Lan; Gong, Bing |
| Journal of publication |
Chemical communications (Cambridge, England) |
| Year of publication |
2010 |
| Journal volume |
46 |
| Journal issue |
7 |
| Pages of publication |
1062 - 1064 |
| a |
13.7983 ± 0.0003 Å |
| b |
7.5207 ± 0.0002 Å |
| c |
21.252 ± 0.0005 Å |
| α |
90° |
| β |
102.834 ± 0.002° |
| γ |
90° |
| Cell volume |
2150.29 ± 0.09 Å3 |
| Cell temperature |
296 ± 2 K |
| Ambient diffraction temperature |
296 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.078 |
| Residual factor for significantly intense reflections |
0.0527 |
| Weighted residual factors for significantly intense reflections |
0.1471 |
| Weighted residual factors for all reflections included in the refinement |
0.1657 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.035 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
For the version history of this entry, please navigate to main COD server.
The link is:
https://www.crystallography.net/7105248.html