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Information card for entry 7132636
Preview
| Coordinates | 7132636.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C54 H72 B2 N4 Si |
|---|---|
| Calculated formula | C54 H72 B2 N4 Si |
| SMILES | [Si](C)([B]([BH]=C1N(CCN1c1c(cccc1CC)CC)c1c(CC)cccc1CC)=C1N(CCN1c1c(cccc1CC)CC)c1c(cccc1CC)CC)(C)c1ccccc1 |
| Title of publication | Hydrosilylation of BB triple bonds: catalyst- and reductant-free construction of B-Si bonds and B<sub>2</sub>Si heterocycles. |
| Authors of publication | Brückner, Tobias; Duwe, Dario; Fantuzzi, Felipe; Heß, Merlin; Dewhurst, Rian D.; Radacki, Krzysztof; Braunschweig, Holger |
| Journal of publication | Chemical communications (Cambridge, England) |
| Year of publication | 2024 |
| Journal volume | 60 |
| Journal issue | 24 |
| Pages of publication | 3259 - 3262 |
| a | 12.4737 ± 0.0003 Å |
| b | 14.971 ± 0.0004 Å |
| c | 26.1547 ± 0.0007 Å |
| α | 90° |
| β | 92.786 ± 0.001° |
| γ | 90° |
| Cell volume | 4878.5 ± 0.2 Å3 |
| Cell temperature | 130 ± 2 K |
| Ambient diffraction temperature | 130 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0583 |
| Residual factor for significantly intense reflections | 0.0452 |
| Weighted residual factors for significantly intense reflections | 0.1079 |
| Weighted residual factors for all reflections included in the refinement | 0.1175 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.028 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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