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Information card for entry 7133026
Preview
| Coordinates | 7133026.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C57 H67 B N4 O2 Si |
|---|---|
| Calculated formula | C57 H67 B N4 O2 Si |
| SMILES | [Si]12(Oc3c4ccccc4c4c(c3O1)cccc4)([N](=C(N2C(C)(C)C)c1ccccc1)C(C)(C)C)C#CB1N(C=CN1c1c(cccc1C(C)C)C(C)C)c1c(cccc1C(C)C)C(C)C |
| Title of publication | Synthetic, structural and reactivity studies of a boryl-ethynyl Silylene. |
| Authors of publication | Chen, Wenhao; Hu, Haisheng; Feng, Jie; Zhu, Lei; Wu, Di |
| Journal of publication | Chemical communications (Cambridge, England) |
| Year of publication | 2024 |
| Journal volume | 60 |
| Journal issue | 45 |
| Pages of publication | 5828 - 5831 |
| a | 12.9587 ± 0.0003 Å |
| b | 24.1745 ± 0.0005 Å |
| c | 16.8361 ± 0.0004 Å |
| α | 90° |
| β | 103.559 ± 0.001° |
| γ | 90° |
| Cell volume | 5127.2 ± 0.2 Å3 |
| Cell temperature | 170 ± 2 K |
| Ambient diffraction temperature | 170 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0791 |
| Residual factor for significantly intense reflections | 0.0468 |
| Weighted residual factors for significantly intense reflections | 0.0979 |
| Weighted residual factors for all reflections included in the refinement | 0.1149 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.024 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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