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Information card for entry 7152333
Preview
| Coordinates | 7152333.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C79 H118 I2 O10 |
|---|---|
| Calculated formula | C79 H118 I2 O10 |
| SMILES | O(c1cc2c(OCCCC)cc1Cc1cc(OCCCC)c(Cc3cc(OCCCC)c(Cc4cc(OCCCC)c(Cc5cc(OCCCC)c(C2)cc5OCCCC)cc4OCCCC)cc3OCCCC)cc1OCCCC)CCCC.ICCCCI |
| Title of publication | Complexation of neutral 1,4-dihalobutanes with simple pillar[5]arenes that is dominated by dispersion forces. |
| Authors of publication | Shu, Xiaoyan; Fan, Jiazeng; Li, Jian; Wang, Xiaoyang; Chen, Wei; Jia, Xueshun; Li, Chunju |
| Journal of publication | Organic & biomolecular chemistry |
| Year of publication | 2012 |
| Journal volume | 10 |
| Journal issue | 17 |
| Pages of publication | 3393 - 3397 |
| a | 15.136 ± 0.002 Å |
| b | 24.59 ± 0.004 Å |
| c | 24.775 ± 0.004 Å |
| α | 61.226 ± 0.002° |
| β | 81.302 ± 0.002° |
| γ | 74.159 ± 0.002° |
| Cell volume | 7773 ± 2 Å3 |
| Cell temperature | 173 ± 2 K |
| Ambient diffraction temperature | 173 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.2447 |
| Residual factor for significantly intense reflections | 0.197 |
| Weighted residual factors for significantly intense reflections | 0.494 |
| Weighted residual factors for all reflections included in the refinement | 0.5428 |
| Goodness-of-fit parameter for all reflections included in the refinement | 2.082 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7152333.html
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Users of the data should acknowledge the original authors of the
structural data.