Information card for entry 7153964
| Formula |
C48 H52 Si4 |
| Calculated formula |
C48 H52 Si4 |
| SMILES |
c1(c2C3c4c(cccc4C(c2ccc1)C1c2c(cccc2C3c2c1c(ccc2)C#C[Si](C)(C)C)C#C[Si](C)(C)C)C#C[Si](C)(C)C)C#C[Si](C)(C)C |
| Title of publication |
Polyalkynylanthracenes - syntheses, structures and their behaviour towards UV irradiation. |
| Authors of publication |
Lamm, Jan-Hendrik; Glatthor, Johanna; Weddeling, Jan-Henrik; Mix, Andreas; Chmiel, Jasmin; Neumann, Beate; Stammler, Hans-Georg; Mitzel, Norbert W. |
| Journal of publication |
Organic & biomolecular chemistry |
| Year of publication |
2014 |
| Journal volume |
12 |
| Journal issue |
37 |
| Pages of publication |
7355 - 7365 |
| a |
8.564 ± 0.003 Å |
| b |
10.244 ± 0.004 Å |
| c |
12.957 ± 0.005 Å |
| α |
79.45 ± 0.03° |
| β |
82.013 ± 0.015° |
| γ |
76.34 ± 0.011° |
| Cell volume |
1080.4 ± 0.7 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.035 |
| Residual factor for significantly intense reflections |
0.0335 |
| Weighted residual factors for significantly intense reflections |
0.0901 |
| Weighted residual factors for all reflections included in the refinement |
0.0912 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.062 |
| Diffraction radiation wavelength |
1.54178 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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