Information card for entry 7154532
| Formula |
C49 H44 O3 Si2 |
| Calculated formula |
C49 H44 O3 Si2 |
| SMILES |
[Si](C#Cc1c2c(c(c3c4ccc5ccc(OC)c6c7c(OC)ccc8ccc(c13)c(c4c56)c78)C#C[Si](C)(C)C)cc1ccccc1c2)(C)(C)C.O=C(C)C |
| Title of publication |
A dinaphtho[8,1,2-cde:2',1',8'-uva]pentacene derivative and analogues: synthesis, structures, photophysical and electrochemical properties. |
| Authors of publication |
Li, Xiao-Jun; Li, Meng; Lu, Hai-Yan; Chen, Chuan-Feng |
| Journal of publication |
Organic & biomolecular chemistry |
| Year of publication |
2015 |
| Journal volume |
13 |
| Journal issue |
28 |
| Pages of publication |
7628 - 7632 |
| a |
11.361 ± 0.005 Å |
| b |
12.402 ± 0.005 Å |
| c |
15.056 ± 0.005 Å |
| α |
72.031 ± 0.018° |
| β |
82.67 ± 0.02° |
| γ |
89.49 ± 0.03° |
| Cell volume |
2000.4 ± 1.4 Å3 |
| Cell temperature |
173.15 K |
| Ambient diffraction temperature |
173.15 K |
| Number of distinct elements |
4 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.148 |
| Residual factor for significantly intense reflections |
0.1175 |
| Weighted residual factors for significantly intense reflections |
0.3062 |
| Weighted residual factors for all reflections included in the refinement |
0.3362 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.114 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7154532.html