Information card for entry 7201801

Structure parameters

• Formula: C H3 B Cl5 N Si
• Calculated formula: C H3 B Cl5 N Si
• SMILES: Cl[Si](N(B(Cl)Cl)C)(Cl)Cl
• Title of publication: Towards continuous processes for the synthesis of precursors of amorphous Si/B/N/C ceramics
• Authors of publication: Weinmann, Markus; Kroschel, Matthias; Jäschke, Thomas; Nuss, Jürgen; Jansen, Martin; Kolios, Grigorios; Morillo, Aristides; Tellaeche, Carlos; Nieken, Ulrich
• Journal of publication: Journal of Materials Chemistry
• Year of publication: 2008
• Journal volume: 18
• Journal issue: 15
• Pages of publication: 1810
• a: 7.0996 ± 0.0013 Å
• b: 6.8561 ± 0.0012 Å
• c: 8.9728 ± 0.0016 Å
• α: 90°
• β: 94.854 ± 0.003°
• γ: 90°
• Cell volume: 435.19 ± 0.13 ų
• Cell temperature: 100 ± 2 K
• Ambient diffraction temperature: 100 ± 2 K
• Number of distinct elements: 6
• Space group number: 11
• Hermann-Mauguin space group symbol: P 1 21/m 1
• Hall space group symbol: -P 2yb
• Residual factor for all reflections: 0.0312
• Residual factor for significantly intense reflections: 0.0273
• Weighted residual factors for significantly intense reflections: 0.0672
• Weighted residual factors for all reflections included in the refinement: 0.0697
• Goodness-of-fit parameter for all reflections included in the refinement: 1.076
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No