Information card for entry 7202075
| Formula |
C47 H34 Si |
| Calculated formula |
C47 H34 Si |
| SMILES |
[Si]1(C(=C(C(=C1c1ccccc1)c1ccccc1)c1ccccc1)c1ccccc1)(c1ccccc1)C1c2ccccc2c2ccccc12 |
| Title of publication |
Fluorenyl-substituted silole molecules: geometric, electronic, optical, and device properties |
| Authors of publication |
Zhan, Xiaowei; Haldi, Andreas; Risko, Chad; Chan, Calvin K.; Zhao, Wei; Timofeeva, Tatiana V.; Korlyukov, Aleksander; Antipin, Mikhail Yu.; Montgomery, Sarah; Thompson, Evans; An, Zesheng; Domercq, Benoit; Barlow, Stephen; Kahn, Antoine; Kippelen, Bernard; Brédas, Jean-Luc; Marder, Seth R. |
| Journal of publication |
Journal of Materials Chemistry |
| Year of publication |
2008 |
| Journal volume |
18 |
| Journal issue |
26 |
| Pages of publication |
3157 |
| a |
13.448 ± 0.004 Å |
| b |
10.218 ± 0.002 Å |
| c |
25.111 ± 0.006 Å |
| α |
90° |
| β |
97.34 ± 0.02° |
| γ |
90° |
| Cell volume |
3422.3 ± 1.5 Å3 |
| Cell temperature |
120 ± 2 K |
| Ambient diffraction temperature |
120 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.0683 |
| Residual factor for significantly intense reflections |
0.0416 |
| Weighted residual factors for significantly intense reflections |
0.095 |
| Weighted residual factors for all reflections included in the refinement |
0.0998 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.038 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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