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Information card for entry 7204116
Preview
| Coordinates | 7204116.cif |
|---|---|
| Original paper (by DOI) | HTML |
| External links | PubChem |
| Chemical name | 4,4',5,5'-tetraiodotetrathiafulvalene |
|---|---|
| Formula | C6 I4 S4 |
| Calculated formula | C6 I4 S4 |
| Title of publication | Synthesis and crystal engineering of new halogenated tetrathiafulvalene (TTF) derivatives and their charge transfer complexes and radical ion salts |
| Authors of publication | Batsanov, Andrei S.; Bryce, Martin R.; Chesney, Antony; Howard, Judith A. K.; John, Derek E.; Moore, Adrian J.; Wood, Clare L.; Gershtenman, Hagit; Becker, James Y.; Khodorkovsky, Vladimir Y.; Ellern, Arkady; Bernstein, Joel; Perepichka, Igor F.; Rotello, Vincent; Gray, Mark; Cuello, Alejandro O. |
| Journal of publication | Journal of Materials Chemistry |
| Year of publication | 2001 |
| Journal volume | 11 |
| Journal issue | 9 |
| Pages of publication | 2181 |
| a | 4.19 ± 0.001 Å |
| b | 11.746 ± 0.002 Å |
| c | 14.294 ± 0.003 Å |
| α | 95.18 ± 0.01° |
| β | 91.92 ± 0.01° |
| γ | 96.69 ± 0.01° |
| Cell volume | 695.2 ± 0.3 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 3 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0606 |
| Residual factor for significantly intense reflections | 0.054 |
| Weighted residual factors for all reflections | 0.1533 |
| Weighted residual factors for significantly intense reflections | 0.1409 |
| Goodness-of-fit parameter for all reflections | 1.14 |
| Goodness-of-fit parameter for significantly intense reflections | 1.165 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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