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Information card for entry 7205567
Preview
| Coordinates | 7205567.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C30 H54 N8 O8 S2 |
|---|---|
| Calculated formula | C30 H54 N8 O8 S2 |
| SMILES | C(=[NH2+])(N)N.c1(cc2c(cc1)cc(cc2)S(=O)(=O)[O-])S(=O)(=O)[O-].C1(CCCC([N]1=O)(C)C)(C)C.C(=[NH2+])(N)N.C1(CCCC([N]1=O)(C)C)(C)C |
| Title of publication | Regulating low-dimensional magnetic behavior of organic radicals in crystalline hydrogen-bonded host frameworks |
| Authors of publication | Soegiarto, Airon C.; Yan, Wah; Kent, Andrew D.; Ward, Michael D. |
| Journal of publication | Journal of Materials Chemistry |
| Year of publication | 2011 |
| Journal volume | 21 |
| Journal issue | 7 |
| Pages of publication | 2204 |
| a | 12.7246 ± 0.0008 Å |
| b | 12.41 ± 0.0008 Å |
| c | 24.2921 ± 0.0015 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 3836 ± 0.4 Å3 |
| Cell temperature | 200 ± 2 K |
| Ambient diffraction temperature | 200 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 61 |
| Hermann-Mauguin space group symbol | P b c a |
| Hall space group symbol | -P 2ac 2ab |
| Residual factor for all reflections | 0.0389 |
| Residual factor for significantly intense reflections | 0.0343 |
| Weighted residual factors for significantly intense reflections | 0.0941 |
| Weighted residual factors for all reflections included in the refinement | 0.0994 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.047 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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