Information card for entry 7207379
| Formula |
C26 H8 Br2 F14 N2 O4 |
| Calculated formula |
C26 H8 Br2 F14 N2 O4 |
| SMILES |
c1(Br)c2cc3C(=O)N(C(=O)c3cc2c(c2cc3C(=O)N(C(=O)c3cc12)CC(F)(F)C(F)(F)C(F)(F)F)Br)CC(F)(F)C(F)(F)C(F)(F)F |
| Title of publication |
Anthracenedicarboximide-based semiconductors for air-stable, n-channel organic thin-film transistors: materials design, synthesis, and structural characterization |
| Authors of publication |
Usta, Hakan; Kim, Choongik; Wang, Zhiming; Lu, Shaofeng; Huang, Hui; Facchetti, Antonio; Marks, Tobin J. |
| Journal of publication |
Journal of Materials Chemistry |
| Year of publication |
2012 |
| Journal volume |
22 |
| Journal issue |
10 |
| Pages of publication |
4459 |
| a |
5.2396 ± 0.0002 Å |
| b |
11.2287 ± 0.0004 Å |
| c |
11.5459 ± 0.0005 Å |
| α |
94.362 ± 0.003° |
| β |
99.095 ± 0.002° |
| γ |
103.466 ± 0.002° |
| Cell volume |
647.79 ± 0.04 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
6 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0497 |
| Residual factor for significantly intense reflections |
0.0334 |
| Weighted residual factors for significantly intense reflections |
0.0692 |
| Weighted residual factors for all reflections included in the refinement |
0.0732 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.967 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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