Information card for entry 7211100
| Formula |
C34 H26 N2 O |
| Calculated formula |
C34 H26 N2 O |
| SMILES |
O(c1ccc(/C=C(c2ccc(c3ccc(N(c4ccccc4)c4ccccc4)cc3)cc2)\C#N)cc1)C |
| Title of publication |
Heating and mechanical force-induced “turn on” fluorescence of cyanostilbene derivative with H-type stacking |
| Authors of publication |
Zhang, Yujian; Sun, Jingwei; Lv, Xiaojing; Ouyang, Mi; Cao, Feng; Pan, Guoxiang; Pan, Luping; Fan, Guangbo; Yu, Weiwei; He, Chao; Zheng, Sishi; Zhang, Feng; Wang, Wei; Zhang, Cheng |
| Journal of publication |
CrystEngComm |
| Year of publication |
2013 |
| Journal volume |
15 |
| Journal issue |
44 |
| Pages of publication |
8998 |
| a |
6.897 ± 0.003 Å |
| b |
45.92 ± 0.02 Å |
| c |
8.08 ± 0.004 Å |
| α |
90° |
| β |
94.826 ± 0.007° |
| γ |
90° |
| Cell volume |
2550 ± 2 Å3 |
| Cell temperature |
293 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.1298 |
| Residual factor for significantly intense reflections |
0.0865 |
| Weighted residual factors for significantly intense reflections |
0.2139 |
| Weighted residual factors for all reflections included in the refinement |
0.231 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.065 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7211100.html