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Information card for entry 7213064
Preview
| Coordinates | 7213064.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C16 H20 Ni S8 |
|---|---|
| Calculated formula | C16 H20 Ni S8 |
| SMILES | [Ni]12(SC3=C(S1)S[C@H]1[C@H](CCCC1)S3)SC1=C(S2)S[C@H]2[C@H](CCCC2)S1 |
| Title of publication | Synthesis, structure and optical limiting effect of two new nickel complexes containing strongly bound geometrically fixed multi‐sulfur 1,2‐dithiolene ligands showing remarkable near‐IR absorption |
| Authors of publication | Bai, Jun‐Feng; Zuo, Jing‐Lin; Tan, Wei‐Lian; Ji, Wei; Shen, Zhen; Fun, Hoong‐Kun; Chinnakali, Kandasamy; Abdul Razak, Ibrahim; You, Xiao‐Zeng; Che, Chi‐Ming |
| Journal of publication | Journal of Materials Chemistry |
| Year of publication | 1999 |
| Journal volume | 9 |
| Journal issue | 10 |
| Pages of publication | 2419 |
| a | 12.171 ± 0.002 Å |
| b | 5.2299 ± 0.0007 Å |
| c | 16.567 ± 0.002 Å |
| α | 90° |
| β | 107.709 ± 0.01° |
| γ | 90° |
| Cell volume | 1004.6 ± 0.3 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0247 |
| Residual factor for significantly intense reflections | 0.0211 |
| Weighted residual factors for all reflections | 0.0528 |
| Weighted residual factors for significantly intense reflections | 0.051 |
| Goodness-of-fit parameter for all reflections | 1.06 |
| Goodness-of-fit parameter for significantly intense reflections | 1.074 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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