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Information card for entry 7223429
Preview
| Coordinates | 7223429.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C53 H98 Cl N15 O2 Si3 Zr |
|---|---|
| Calculated formula | C53 H98 Cl N15 O2 Si3 Zr |
| SMILES | [Zr]123(Cl)([N](c4ccccc4)=C(N(C)C)N1/C(N(C)C)=N/[Si](C)(C)C)([N](c1ccccc1)=C(N(C)C)N3/C(=N/[Si](C)(C)C)N(C)C)[N](c1ccccc1)=C(N(C)C)N2C(=N\[Si](C)(C)C)/N(C)C.O(CC)CC.O(CC)CC |
| Title of publication | Organoamido zirconium(IV) and titanium(IV) complexes and their catalysis towards ethylene polymerization |
| Authors of publication | Zhou, Meisu; Yang, Qiaokun; Tong, Hongbo |
| Journal of publication | RSC Adv. |
| Year of publication | 2015 |
| a | 12.6863 ± 0.0019 Å |
| b | 14.732 ± 0.002 Å |
| c | 18.976 ± 0.003 Å |
| α | 87.593 ± 0.004° |
| β | 76.51 ± 0.003° |
| γ | 82.086 ± 0.004° |
| Cell volume | 3415.6 ± 0.9 Å3 |
| Cell temperature | 200 ± 2 K |
| Ambient diffraction temperature | 200 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.1 |
| Residual factor for significantly intense reflections | 0.0534 |
| Weighted residual factors for significantly intense reflections | 0.0997 |
| Weighted residual factors for all reflections included in the refinement | 0.1201 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.008 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/7223429.html
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Users of the data should acknowledge the original authors of the
structural data.