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Information card for entry 7244405
Preview
| Coordinates | 7244405.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Chemical name | IPhO-Cl6BsubPc |
|---|---|
| Formula | C30 H10 B Cl6 I N6 O |
| Calculated formula | C30 H10 B Cl6 I N6 O |
| SMILES | Ic1cc(O[B]23[n]4c5=Nc6n3c(N=c3n2c(=Nc4c2c5cc(Cl)c(Cl)c2)c2cc(Cl)c(Cl)cc32)c2cc(Cl)c(Cl)cc62)ccc1 |
| Title of publication | Analysis of the solvent effects on the crystal growth of peripherally chlorinated boron subphthalocyanines |
| Authors of publication | Wojtkiewicz, Kacper; Lough, Alan; Bender, Timothy P. |
| Journal of publication | CrystEngComm |
| Year of publication | 2022 |
| Journal volume | 24 |
| Journal issue | 15 |
| Pages of publication | 2791 - 2807 |
| a | 15.8551 ± 0.0003 Å |
| b | 15.1122 ± 0.0003 Å |
| c | 23.9203 ± 0.0005 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 5731.4 ± 0.2 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 29 |
| Hermann-Mauguin space group symbol | P c a 21 |
| Hall space group symbol | P 2c -2ac |
| Residual factor for all reflections | 0.0289 |
| Residual factor for significantly intense reflections | 0.0255 |
| Weighted residual factors for significantly intense reflections | 0.0652 |
| Weighted residual factors for all reflections included in the refinement | 0.0665 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.025 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7244405.html
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Users of the data should acknowledge the original authors of the
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