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Information card for entry 7248710
Preview
| Coordinates | 7248710.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C15 H14 F3 N O2 S |
|---|---|
| Calculated formula | C15 H14 F3 N O2 S |
| SMILES | S(=O)(=O)(NCCc1ccccc1)c1ccc(cc1)C(F)(F)F |
| Title of publication | Crystal engineering for intramolecular π–π stacking: effect of substitution of electron-donating and electron-withdrawing groups on the molecular geometry in conformationally flexible Sulfoesters and sulfonamides |
| Authors of publication | Shaikh, Samir R.; Gawade, Rupesh L.; Dabke, Niteen B.; Dash, Soumya R.; Vanka, Kumar; Gonnade, Rajesh G. |
| Journal of publication | CrystEngComm |
| Year of publication | 2024 |
| Journal volume | 26 |
| Journal issue | 26 |
| Pages of publication | 3557 - 3573 |
| a | 10.1905 ± 0.0006 Å |
| b | 26.3756 ± 0.0019 Å |
| c | 11.062 ± 0.0008 Å |
| α | 90° |
| β | 94.342 ± 0.002° |
| γ | 90° |
| Cell volume | 2964.7 ± 0.3 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 4 |
| Hermann-Mauguin space group symbol | P 1 21 1 |
| Hall space group symbol | P 2yb |
| Residual factor for all reflections | 0.0642 |
| Residual factor for significantly intense reflections | 0.0559 |
| Weighted residual factors for significantly intense reflections | 0.1515 |
| Weighted residual factors for all reflections included in the refinement | 0.1585 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.048 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/7248710.html
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Users of the data should acknowledge the original authors of the
structural data.