Information card for entry 7710594
| Formula |
C32 H52 B Br N3 Si |
| Calculated formula |
C32 H52 B Br N3 Si |
| Title of publication |
High yield of a variety of silicon-boron radicals and their reactivity |
| Authors of publication |
Roesky, Herbert W.; Nazish, Mohd; Ding, Yi; Legendre, Christina M.; Kumar, Arun; Graw, Nico; Schwederski, Brigitte; Herbst-Irmer, Regine; P, Parvathy; Parameswaran, Pattiyil; Stalke, Dietmar; Kaim, Wolfgang |
| Journal of publication |
Dalton Transactions |
| Year of publication |
2022 |
| a |
11.102 ± 0.002 Å |
| b |
14.901 ± 0.002 Å |
| c |
21.157 ± 0.003 Å |
| α |
90° |
| β |
102.55 ± 0.02° |
| γ |
90° |
| Cell volume |
3416.4 ± 0.9 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
6 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.0418 |
| Residual factor for significantly intense reflections |
0.0325 |
| Weighted residual factors for significantly intense reflections |
0.0788 |
| Weighted residual factors for all reflections included in the refinement |
0.083 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.045 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
No |
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