Crystallography Open Database

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Searching journal of publication like 'Journal of Applied Crystallography' volume of publication is 48

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2300506 CIF
HKL
C24 H22 Cl6 N2 O4P 1 21/n 16.8524; 11.9655; 17.3274
90; 99.678; 90
1400.5Kong, Jianfei; Du, Jialei; Wang, Jiren; Chen, Zuofeng
Supramolecular organic frameworks of a Schiff base showing selective guest adsorption
Journal of Applied Crystallography, 2015, 48
2300507 CIF
HKL
C26 H28 N2 O5P 1 21/c 113.2363; 11.765; 17.6353
90; 103.281; 90
2672.8Kong, Jianfei; Du, Jialei; Wang, Jiren; Chen, Zuofeng
Supramolecular organic frameworks of a Schiff base showing selective guest adsorption
Journal of Applied Crystallography, 2015, 48
2300508 CIF
HKL
C32 H28 N4 O4P 1 2/c 112.8209; 7.0395; 14.7623
90; 96.82; 90
1322.91Kong, Jianfei; Du, Jialei; Wang, Jiren; Chen, Zuofeng
Supramolecular organic frameworks of a Schiff base showing selective guest adsorption
Journal of Applied Crystallography, 2015, 48
2300509 CIF
HKL
C6 H9 N3 O6P n a 219.0136; 21.5; 4.7005
90; 90; 90
910.9Prasad, A. Aditya; Meenakshisundaram, S. P.
Hydrogen-bonded supramolecular architecture in nonlinear optical ammonium 2,4-dinitrophenolate hydrate
Journal of Applied Crystallography, 2015, 48
2300513 CIF
HKL
C32 H39 N O2P 1 21/c 116.589; 10.9575; 16.6795
90; 113.623; 90
2777.8Sharma, Ranjana; Prasher, Dixit; Tiwari, R. K.
Crystal structure analysis of ebastine [4-(4-benzhydryloxy-1-piperidyl)-1-(4-<i>tert</i>-butylphenyl) butan-1-one]: an oral histamine antagonist
Journal of Applied Crystallography, 2015, 48
2300556 CIFCl H Ni OR -3 m :H3.26061; 3.26061; 17.00619
90; 90; 120
156.58Bette, Sebastian; Dinnebier, Robert E.; Freyer, Daniela
Structure solution and refinement of stacking-faulted NiCl(OH)
Journal of Applied Crystallography, 2015, 48
2300557 CIF
HKL
C12 H22 O11P 1 21 17.763; 8.7109; 10.8701
90; 102.937; 90
716.407Dmitrienko, Artem O.; Bushmarinov, Ivan S.
Reliable structural data from Rietveld refinements <i>via</i> restraint consistency
Journal of Applied Crystallography, 2015, 48
2300558 CIFNi SiP n m a5.1731; 3.3381; 5.6049
90; 90; 90
96.79Lord, Oliver T.; Thomson, Andrew R.; Wann, Elizabeth T. H.; Wood, Ian G.; Dobson, David P.; Vocadlo, Lidunka
The equation of state of the <i>Pmmn</i> phase of NiSi
Journal of Applied Crystallography, 2015, 48, 1914-1920
2300559 CIF
HKL
Paper
C28 H18 N2C 1 2/c 113.5559; 12.2134; 12.6643
90; 118.834; 90
1836.8Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913
2300560 CIF
HKL
Paper
C28 H18 N2C 1 2/c 113.5537; 12.2132; 12.6619
90; 118.836; 90
1836.1Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913
2300561 CIF
HKL
Paper
C28 H18 N2C 1 2/c 113.5559; 12.2134; 12.6643
90; 118.834; 90
1836.8Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913
2300562 CIF
HKL
Paper
C12 H4 N4C 1 2/c 18.896; 6.913; 16.439
90; 98.29; 90
1000.4Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913
2300563 CIF
HKL
Paper
C12 H4 N4C 1 2/c 18.884; 6.9036; 16.421
90; 98.241; 90
996.7Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913
2300564 CIF
HKL
Paper
C12 H4 N4C 1 2/c 18.896; 6.913; 16.439
90; 98.29; 90
1000.4Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913
2300565 CIF
HKL
Paper
C18 H17 Cu O6C 1 2/c 19.7935; 19.0055; 18.2997
90; 94.7996; 90
3394.2Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913
2300566 CIF
HKL
Paper
C18 H17 Cu O6C 1 2/c 19.7936; 18.9973; 18.2982
90; 94.84; 90
3392.3Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913
2300567 CIF
HKL
Paper
C18 H17 Cu O6C 1 2/c 19.7935; 19.0055; 18.2997
90; 94.7996; 90
3394.2Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913
2300568 CIF
HKL
Paper
C34 H26 Mg N4 O4P 1 21/n 111.3068; 14.9595; 16.7252
90; 93.05; 90
2825Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913
2300569 CIF
HKL
Paper
C34 H26 Mg N4 O4P 1 21/n 111.3182; 14.9745; 16.744
90; 93.044; 90
2833.8Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913
2300570 CIF
HKL
Paper
C34 H26 Mg N4 O4P 1 21/n 111.3068; 14.9595; 16.7252
90; 93.05; 90
2825Krause, Lennard; Herbst-Irmer, Regine; Stalke, Dietmar
An empirical correction for the influence of low-energy contamination
Journal of Applied Crystallography, 2015, 48, 1907-1913

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