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Information card for entry 1504779
Preview
Coordinates | 1504779.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | TD2TD |
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Formula | C30 H44 O4 S5 Si2 |
Calculated formula | C30 H44 O4 S5 Si2 |
SMILES | s1c(cc2c1c1c(S2(=O)=O)c2c(s1)c1c(s2)C=C(S1(=O)=O)[Si](C(C)C)(C(C)C)C(C)C)[Si](C(C)C)(C(C)C)C(C)C |
Title of publication | Electronic modulation of fused oligothiophenes by chemical oxidation. |
Authors of publication | Suzuki, Yoshitake; Okamoto, Toshihiro; Wakamiya, Atsushi; Yamaguchi, Shigehiro |
Journal of publication | Organic letters |
Year of publication | 2008 |
Journal volume | 10 |
Journal issue | 16 |
Pages of publication | 3393 - 3396 |
a | 7.074 ± 0.002 Å |
b | 13.714 ± 0.004 Å |
c | 17.962 ± 0.005 Å |
α | 90° |
β | 100.071 ± 0.0016° |
γ | 90° |
Cell volume | 1715.7 ± 0.8 Å3 |
Cell temperature | 173 ± 2 K |
Ambient diffraction temperature | 173 ± 2 K |
Number of distinct elements | 5 |
Space group number | 4 |
Hermann-Mauguin space group symbol | P 1 21 1 |
Hall space group symbol | P 2yb |
Residual factor for all reflections | 0.1091 |
Residual factor for significantly intense reflections | 0.0696 |
Weighted residual factors for significantly intense reflections | 0.1204 |
Weighted residual factors for all reflections included in the refinement | 0.1427 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.039 |
Diffraction radiation wavelength | 0.7107 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
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The link is: https://www.crystallography.net/1504779.html
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