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Information card for entry 1507234
Preview
| Coordinates | 1507234.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C45 H64 I2 N2 Ni O5 |
|---|---|
| Calculated formula | C45 H63.068 I2 N2 Ni O5 |
| SMILES | Ic1ccc2O[Ni]34Oc5ccc(I)cc5C=[N]4c4c([N]3=Cc2c1)cc(OCCCCCCCCCCCC)c(OCCCCCCCCCCCC)c4.OC |
| Title of publication | Poly(salphenyleneethynylene)s: A New Class of Soluble, Conjugated, Metal-Containing Polymers |
| Authors of publication | Leung, Alfred C. W.; Chong, Jonathan H.; Patrick, Brian O.; MacLachlan, Mark J. |
| Journal of publication | Macromolecules |
| Year of publication | 2003 |
| Journal volume | 36 |
| Journal issue | 14 |
| Pages of publication | 5051 |
| a | 21.2475 ± 0.0015 Å |
| b | 8.9428 ± 0.0004 Å |
| c | 25.4798 ± 0.0018 Å |
| α | 90° |
| β | 111.589 ± 0.003° |
| γ | 90° |
| Cell volume | 4501.8 ± 0.5 Å3 |
| Cell temperature | 173 ± 2 K |
| Ambient diffraction temperature | 173 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/a 1 |
| Hall space group symbol | -P 2yab |
| Residual factor for all reflections | 0.0753 |
| Residual factor for significantly intense reflections | 0.0377 |
| Weighted residual factors for significantly intense reflections | 0.0725 |
| Weighted residual factors for all reflections included in the refinement | 0.0807 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.876 |
| Diffraction radiation wavelength | 0.71069 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/1507234.html
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