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Information card for entry 1513288
Preview
Coordinates | 1513288.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C56 H87 B2 Li Nd O3 Si |
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Calculated formula | C56 H87 B2 Li Nd O3 Si |
SMILES | [BH3][H][Nd]123456789%10%11([H][BH]([H]4)[H]5)[c]4([c]56[c]7([c]86[c]14cc(cc6)C(C)(C)C)ccc(c5)C(C)(C)C)[Si]([c]12[c]92cc(cc[c]%102[c]%112[c]31cc(cc2)C(C)(C)C)C(C)(C)C)(C)C.[Li]([O]1CCCC1)([O]1CCCC1)[O]1CCCC1 |
Title of publication | ansa-Bis(fluorenyl)neodymium Catalysts for Cyclocopolymerization of Ethylene with Butadiene |
Authors of publication | Thuilliez, Julien; Ricard, Louis; Nief, François; Boisson, Fernande; Boisson, Christophe |
Journal of publication | Macromolecules |
Year of publication | 2009 |
Journal volume | 42 |
Journal issue | 11 |
Pages of publication | 3774 |
a | 16.534 ± 0.001 Å |
b | 18.049 ± 0.001 Å |
c | 21.215 ± 0.001 Å |
α | 75.06 ± 0.001° |
β | 71.05 ± 0.001° |
γ | 71.2 ± 0.001° |
Cell volume | 5584.9 ± 0.5 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 7 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.1 |
Residual factor for significantly intense reflections | 0.0548 |
Weighted residual factors for significantly intense reflections | 0.1261 |
Weighted residual factors for all reflections included in the refinement | 0.1582 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.112 |
Diffraction radiation wavelength | 0.71069 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/1513288.html
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Users of the data should acknowledge the original authors of the
structural data.