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Information card for entry 1514950
Preview
Coordinates | 1514950.cif |
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Original paper (by DOI) | HTML |
Formula | C54 H44 N2 Si |
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Calculated formula | C54 H44 N2 Si |
SMILES | [Si]1(C(=C(C(=C1c1ccc(N(c2ccccc2)c2ccccc2)cc1)c1ccccc1)c1ccccc1)c1ccc(N(c2ccccc2)c2ccccc2)cc1)(C)C |
Title of publication | Siloles symmetrically substituted on their 2,5-positions with electron-accepting and donating moieties: facile synthesis, aggregation-enhanced emission, solvatochromism, and device application |
Authors of publication | Mei, Ju; Wang, Jian; Sun, Jing Zhi; Zhao, Hui; Yuan, Wangzhang; Deng, Chunmei; Chen, Shuming; Sung, Herman H. Y.; Lu, Ping; Qin, Anjun; Kwok, Hoi Sing; Ma, Yuguang; Williams, Ian D.; Tang, Ben Zhong |
Journal of publication | Chemical Science |
Year of publication | 2012 |
Journal volume | 3 |
Journal issue | 2 |
Pages of publication | 549 |
a | 20.3587 ± 0.0004 Å |
b | 11.0369 ± 0.0003 Å |
c | 18.2729 ± 0.0008 Å |
α | 90° |
β | 93.111 ± 0.002° |
γ | 90° |
Cell volume | 4099.8 ± 0.2 Å3 |
Cell temperature | 133 ± 2 K |
Ambient diffraction temperature | 133 ± 2 K |
Number of distinct elements | 4 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0485 |
Residual factor for significantly intense reflections | 0.0371 |
Weighted residual factors for significantly intense reflections | 0.0902 |
Weighted residual factors for all reflections included in the refinement | 0.0933 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.02 |
Diffraction radiation wavelength | 1.5418 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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