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Information card for entry 1515310
Preview
| Coordinates | 1515310.cif |
|---|---|
| Original paper (by DOI) | HTML |
| External links | PubChem |
| Formula | C28 H32 N2 O2 |
|---|---|
| Calculated formula | C28 H32 N2 O2 |
| SMILES | O=C(N(C(=O)c1cc2cc3c(cccc3)cc2cc1)C1CCCCC1)NC1CCCCC1 |
| Title of publication | Studies of the solvatochromic emission properties of N-aroylurea derivatives I: Influence of the substitution pattern. |
| Authors of publication | Bergen, Anna; Bohne, Cornelia; Fuentealba, Denis; Ihmels, Heiko; Pace, Tamara C. S.; Waidelich, Michael; Yihwa, Chang; Willem Bats, Jan |
| Journal of publication | Photochemical & photobiological sciences : Official journal of the European Photochemistry Association and the European Society for Photobiology |
| Year of publication | 2012 |
| Journal volume | 11 |
| Journal issue | 4 |
| Pages of publication | 752 - 767 |
| a | 10.6241 ± 0.0008 Å |
| b | 9.6218 ± 0.0007 Å |
| c | 22.951 ± 0.0016 Å |
| α | 90° |
| β | 93.646 ± 0.002° |
| γ | 90° |
| Cell volume | 2341.4 ± 0.3 Å3 |
| Cell temperature | 171 ± 2 K |
| Ambient diffraction temperature | 171 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.237 |
| Residual factor for significantly intense reflections | 0.1095 |
| Weighted residual factors for significantly intense reflections | 0.1316 |
| Weighted residual factors for all reflections included in the refinement | 0.1627 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.116 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/1515310.html
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Users of the data should acknowledge the original authors of the
structural data.