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Information card for entry 1543643
Preview
Coordinates | 1543643.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C24 H56 Cl4 La2 O12 |
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Calculated formula | C24 H56 Cl4 La2 O12 |
SMILES | [La]123(Cl)(Cl)([OH][C@H](COC)C)([O](C)C[C@H](O1)C)[O](C)C[C@H]([O]2[La]12(Cl)(Cl)([OH][C@@H](COC)C)([O](C)C[C@@H](O1)C)[O](C)C[C@@H]([O]32)C)C |
Title of publication | Identification of dipole disorder in low temperature solution processed oxides: its utility and suppression for transparent high performance solution-processed hybrid electronics |
Authors of publication | Banger, Kulbinder; Warwick, Christopher; Lang, Jiang; Broch, Katharina; Halpert, Jonathan E.; Socratous, Josephine; Brown, Adam; Leedham, Timothy; Sirringhaus, Henning |
Journal of publication | Chem. Sci. |
Year of publication | 2016 |
Journal volume | 7 |
Journal issue | 10 |
Pages of publication | 6337 |
a | 11.31 ± 0.0002 Å |
b | 10.2958 ± 0.0002 Å |
c | 17.6004 ± 0.0003 Å |
α | 90° |
β | 95.49 ± 0.001° |
γ | 90° |
Cell volume | 2040.09 ± 0.06 Å3 |
Cell temperature | 180 ± 2 K |
Ambient diffraction temperature | 180 ± 2 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.0467 |
Residual factor for significantly intense reflections | 0.0259 |
Weighted residual factors for significantly intense reflections | 0.0548 |
Weighted residual factors for all reflections included in the refinement | 0.0564 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.963 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/1543643.html
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Users of the data should acknowledge the original authors of the
structural data.