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Information card for entry 1548089
Preview
Coordinates | 1548089.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C53 H115 K N5 O10 Si3 U |
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Calculated formula | C53 H115 K N5 O10 Si3 U |
SMILES | [U]123(N([Si](C(C)C)(C(C)C)C(C)C)CC[N]3(CCN2[Si](C(C)C)(C(C)C)C(C)C)CCN1[Si](C(C)C)(C(C)C)C(C)C)#N.[K]12345678([O]9CC[O]1CC[O]2CC[O]3CC[O]4CC9)[O]1CC[O]5CC[O]6CC[O]7CC[O]8CC1 |
Title of publication | Molecular and electronic structure of terminal and alkali metal-capped uranium(V) nitride complexes |
Authors of publication | David M. King; Peter A. Cleaves; Ashley J. Wooles; Benedict M. Gardner; Nicholas F. Chilton; Floriana Tuna; William Lewis; Eric J. L. McInnes; Stephen T. Liddle |
Journal of publication | Nature Communications |
Year of publication | 2016 |
Journal volume | 7 |
Pages of publication | 13773 |
a | 11.3428 ± 0.0003 Å |
b | 16.5053 ± 0.0005 Å |
c | 18.3155 ± 0.0005 Å |
α | 79.554 ± 0.003° |
β | 85.928 ± 0.002° |
γ | 81.641 ± 0.002° |
Cell volume | 3332.79 ± 0.17 Å3 |
Cell temperature | 120 ± 2 K |
Ambient diffraction temperature | 120 ± 2 K |
Number of distinct elements | 7 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0349 |
Residual factor for significantly intense reflections | 0.0321 |
Weighted residual factors for significantly intense reflections | 0.0803 |
Weighted residual factors for all reflections included in the refinement | 0.0823 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.044 |
Diffraction radiation wavelength | 1.54184 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
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