Information card for entry 1550493
| Formula |
C20 H20 Cl N O2 S |
| Calculated formula |
C20 H20 Cl N O2 S |
| SMILES |
S(/C(=C(/NCC=C)c1ccccc1)C(=O)OCC)c1ccc(Cl)cc1 |
| Title of publication |
Electrochemical Oxidative C-H/S-H Cross-Coupling between Enamines and Thiophenols with H2 Evolution |
| Authors of publication |
Lei, Aiwen; Li, Dan-Dan; Li, Shuaibing; Peng, Chong; Lu, Lijun; Wang , Shengchun; Wang, Pan; Chen, Yi-Hung; Cong, Hengjiang |
| Journal of publication |
Chemical Science |
| Year of publication |
2019 |
| a |
11.5425 ± 0.0005 Å |
| b |
20.2515 ± 0.0009 Å |
| c |
8.2218 ± 0.0004 Å |
| α |
90° |
| β |
92.176 ± 0.002° |
| γ |
90° |
| Cell volume |
1920.48 ± 0.15 Å3 |
| Cell temperature |
253 ± 2 K |
| Ambient diffraction temperature |
253 ± 2 K |
| Number of distinct elements |
6 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.0543 |
| Residual factor for significantly intense reflections |
0.0408 |
| Weighted residual factors for significantly intense reflections |
0.1063 |
| Weighted residual factors for all reflections included in the refinement |
0.1159 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.03 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/1550493.html