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Information card for entry 1550741
Preview
Coordinates | 1550741.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C87 H139 Li O3 Si6 |
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Calculated formula | C87 H139 Li O3 Si6 |
SMILES | [Si]123[Si]([Si]41[Si]2([Si]([Si]34c1c(cc(cc1C(C)C)C(C)C)C(C)C)(c1c(cc(cc1C(C)C)C(C)C)C(C)C)c1c(cc(cc1C(C)C)C(C)C)C(C)C)c1c(cc(cc1C(C)C)C(C)C)C(C)C)(c1c(cc(cc1C(C)C)C(C)C)C(C)C)[Li]([O]1CCCC1)([O]1CCCC1)[O]1CCCC1 |
Title of publication | Site-Selective Functionalization of Si6R6 Siliconoids |
Authors of publication | Heider, Yannic; Poitiers, Nadine Elisabeth; Willmes, Philipp; Leszczynska, Kinga; Huch, Volker; Scheschkewitz, David |
Journal of publication | Chemical Science |
Year of publication | 2019 |
a | 14.2918 ± 0.0016 Å |
b | 16.4145 ± 0.0018 Å |
c | 21.516 ± 0.003 Å |
α | 109.652 ± 0.005° |
β | 104.243 ± 0.004° |
γ | 99.97 ± 0.004° |
Cell volume | 4422.7 ± 1 Å3 |
Cell temperature | 175 ± 2 K |
Ambient diffraction temperature | 175 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0952 |
Residual factor for significantly intense reflections | 0.0628 |
Weighted residual factors for significantly intense reflections | 0.1581 |
Weighted residual factors for all reflections included in the refinement | 0.1885 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.064 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
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The link is: https://www.crystallography.net/1550741.html
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Users of the data should acknowledge the original authors of the
structural data.