Information card for entry 1553952
| Formula |
C24 H22 S6 Si2 |
| Calculated formula |
C24 H22 S6 Si2 |
| SMILES |
[Si](C)(C)(C)c1cc2c(s1)sc1c2sc2c1c1c(cc2)sc2c1sc1c2cc([Si](C)(C)C)s1 |
| Title of publication |
Syntheses and structures of [7]helicene and double helicene based on dithieno[2,3-b:2′,3′-d]thiophene |
| Authors of publication |
Liu, Xinming; Sun, Huiliang; Xu, Wan; Wan, Shisheng; Shi, Jianwu; Li, Chunli; Wang, Hua |
| Journal of publication |
Organic Chemistry Frontiers |
| Year of publication |
2018 |
| Journal volume |
5 |
| Journal issue |
8 |
| Pages of publication |
1257 |
| a |
31.277 ± 0.009 Å |
| b |
16.691 ± 0.005 Å |
| c |
10.668 ± 0.003 Å |
| α |
90° |
| β |
93.503 ± 0.006° |
| γ |
90° |
| Cell volume |
5559 ± 3 Å3 |
| Cell temperature |
296 ± 2 K |
| Ambient diffraction temperature |
296 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
15 |
| Hermann-Mauguin space group symbol |
C 1 2/c 1 |
| Hall space group symbol |
-C 2yc |
| Residual factor for all reflections |
0.1099 |
| Residual factor for significantly intense reflections |
0.0642 |
| Weighted residual factors for significantly intense reflections |
0.1494 |
| Weighted residual factors for all reflections included in the refinement |
0.1644 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.046 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
For the version history of this entry, please navigate to main COD server.
The link is:
https://www.crystallography.net/1553952.html