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Information card for entry 1557276
Preview
Coordinates | 1557276.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | Nitronic ester |
---|---|
Formula | C9 H6 N2 O5 |
Calculated formula | C9 N2 O5 |
SMILES | O1[C@@H]2ON(=O)=C(N(=O)=O)[C@@H]2c2ccccc12.O1[C@H]2ON(=O)=C(N(=O)=O)[C@H]2c2ccccc12 |
Title of publication | Photochemical Nitration by Tetranitromethane. Part XL. Regiochemistry of Trinitromethyl Attachment in the Photolysis of Benzofuran with Tetranitromethane |
Authors of publication | Butts, Craig P.; Eberson, Lennart; Gonzales-Luque, Remedios; Hartshorn, Chris M.; Hartshorn, Michael P.; Merchan, Manuela; Robinson, Ward T.; Roos, Bjorn O.; Vallance, Claire; Wood, Bryan R. |
Journal of publication | Acta Chemica Scandinavica |
Year of publication | 1997 |
Journal volume | 51 |
Pages of publication | 984 - 999 |
a | 9.809 ± 0.001 Å |
b | 5.355 ± 0.001 Å |
c | 17.1 ± 0.002 Å |
α | 90° |
β | 101.2 ± 0.01° |
γ | 90° |
Cell volume | 881.1 ± 0.2 Å3 |
Ambient diffraction temperature | 153 K |
Number of distinct elements | 4 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for significantly intense reflections | 0.031 |
Weighted residual factors for significantly intense reflections | 0.091 |
Diffraction radiation probe | x-ray |
Diffraction radiation wavelength | 0.71069 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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