Information card for entry 1558890
| Formula |
C34 H29 N3 O4 |
| Calculated formula |
C34 H29 N3 O4 |
| SMILES |
O=C1N(C(=O)c2ccc3c4ccc5C(=O)N(C(=O)c6cc7[nH]c8cc1c2c3c8c7c4c56)C(CC)CC)C(CC)CC |
| Title of publication |
Acid dyeing for green solvent processing of solvent resistant semiconducting organic thin films |
| Authors of publication |
Harding, Cayley R.; Cann, Jonathan; Laventure, Audrey; Sadeghianlemraski, Mozhgan; Abd-Ellah, Marwa; Rao, Keerthan R.; Gelfand, Benjamin Sidney; Aziz, Hany; Kaake, Loren; Risko, Chad; Welch, Gregory C. |
| Journal of publication |
Materials Horizons |
| Year of publication |
2020 |
| Journal volume |
7 |
| Journal issue |
11 |
| Pages of publication |
2959 - 2969 |
| a |
18.2166 ± 0.0007 Å |
| b |
18.5973 ± 0.001 Å |
| c |
7.8095 ± 0.0002 Å |
| α |
90° |
| β |
97.881 ± 0.002° |
| γ |
90° |
| Cell volume |
2620.71 ± 0.19 Å3 |
| Cell temperature |
173 K |
| Ambient diffraction temperature |
173 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.0639 |
| Residual factor for significantly intense reflections |
0.0581 |
| Weighted residual factors for significantly intense reflections |
0.1587 |
| Weighted residual factors for all reflections included in the refinement |
0.1639 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.026 |
| Diffraction radiation wavelength |
1.54178 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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