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Information card for entry 1563143
Preview
Coordinates | 1563143.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C48 H100 K N7 O6 Si6 U |
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Calculated formula | C48 H100 K N7 O6 Si6 U |
SMILES | [U]1(N([Si](C)(C)C)[Si](C)(C)C)([N](=[N]1c1ccccc1)c1ccccc1)([N]([Si](C)(C)C)[Si](C)(C)C)[N]([Si](C)(C)C)[Si](C)(C)C.[K]1234567[O]8CC[N]96CC[O]2CC[O]3CC[N]7(CC[O]1CC8)CC[O]5CC[O]4CC9 |
Title of publication | Single metal four-electron reduction by U(ii) and masked "U(ii)" compounds. |
Authors of publication | Modder, Dieuwertje K.; Palumbo, Chad T.; Douair, Iskander; Scopelliti, Rosario; Maron, Laurent; Mazzanti, Marinella |
Journal of publication | Chemical science |
Year of publication | 2021 |
Journal volume | 12 |
Journal issue | 17 |
Pages of publication | 6153 - 6158 |
a | 11.477 ± 0.0003 Å |
b | 16.679 ± 0.0008 Å |
c | 19.0067 ± 0.0008 Å |
α | 103.478 ± 0.004° |
β | 101.463 ± 0.003° |
γ | 90.908 ± 0.003° |
Cell volume | 3460.2 ± 0.2 Å3 |
Cell temperature | 140 ± 0.1 K |
Ambient diffraction temperature | 140 ± 0.1 K |
Number of distinct elements | 7 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.1104 |
Residual factor for significantly intense reflections | 0.1069 |
Weighted residual factors for significantly intense reflections | 0.2799 |
Weighted residual factors for all reflections included in the refinement | 0.2818 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.147 |
Diffraction radiation probe | x-ray |
Diffraction radiation wavelength | 1.54184 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/1563143.html
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Users of the data should acknowledge the original authors of the
structural data.