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Information card for entry 1564703
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Coordinates | 1564703.cif |
---|---|
Original paper (by DOI) | HTML |
Chemical name | InOC-5 |
---|---|
Formula | C56 H88 Cl6 F4 In12 N8 O26 |
Calculated formula | C56 H88 Cl6 F4 In12 N8 O26 |
SMILES | c1(ccc(cc1)F)[O]1[In]2345O[In]6789[O](c%10ccc(cc%10)F)[In]%10%11%12([O]%13CC[NH]%14CC[O]2[In]2%15%16%13%14[O]%13%10CC[NH]%16CC[O]2[In]2%10%14([O]3%15[In]3%15%13([O]2c2ccc(cc2)F)O[In]2%13%16%17[O](c%18ccc(cc%18)F)[In]%18%19([O]%20CC[NH]%21CC[O]3[In]3%22%20%21([O]7%18CC[NH]%22CC[O]%113)[O]9%12%15)([O]3CC[NH]7CC[O]9%13[In]%11%1237([O]6CC[NH]%12CC[O]%11[In]319([O]1CC[NH]6CC[O]4%14[In]4716([O]2CC[NH]7CC[O]%104)[O]5%173)Cl)[O]8%16%19)Cl)Cl)Cl.[Cl-].[Cl-] |
Title of publication | Molecular Bixbyite-Like In12-Oxo Clusters with Tunable Functionalization Sites for Lithography Patterning Applications |
Authors of publication | Yi, Xiaofeng; Wang, Di; Li, Fan; Zhang, Jian; Zhang, Lei |
Journal of publication | Chemical Science |
Year of publication | 2021 |
a | 15.9744 ± 0.0002 Å |
b | 15.9744 ± 0.0002 Å |
c | 19.4804 ± 0.0005 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 4971.04 ± 0.16 Å3 |
Cell temperature | 100.03 ± 0.19 K |
Ambient diffraction temperature | 100.03 ± 0.19 K |
Number of distinct elements | 7 |
Space group number | 82 |
Hermann-Mauguin space group symbol | I -4 |
Hall space group symbol | I -4 |
Residual factor for all reflections | 0.028 |
Residual factor for significantly intense reflections | 0.0275 |
Weighted residual factors for significantly intense reflections | 0.0709 |
Weighted residual factors for all reflections included in the refinement | 0.0712 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.086 |
Diffraction radiation wavelength | 1.54178 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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