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Information card for entry 1569148
Preview
| Coordinates | 1569148.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C204 H188 N76 O66 U6 |
|---|---|
| Calculated formula | C204 H188 N76 O66 U6 |
| SMILES | C(=O)(c1ccc(cc1)C[n+]1ccc(cc1)c1ccncc1)O[U]12(=O)(=O)([O]3[U]4(=O)(=O)(O[U]3(=O)(=O)(O1)([OH2])[O]=C1N3C5C6N1CN1C(=O)N7CN8C(=O)N9CN%10C(=O)N%11CN%12C(=O)N%13CN%14C(=O)N%15CN%16C(=O)N%17CN%18C(=O)N(C3)C3C%18N%18CN%19C(=O)N(CN%20C(=O)N(CN%21C(N(CN%22C(=O)N(CN%23C(=O)N(CN%24C(=O)N(CN6C(=O)N5CN3C%18=O)C1C7%24)C8C9%23)C%10C%11%22)C%12C%13%21)=[O][U]13(=O)(=O)([O]5[U](=O)(=O)(O1)(OC(=O)c1ccc(cc1)C[n+]1ccc(cc1)c1ccncc1)([O]=C(c1ccc(cc1)C[n+]1ccc(cc1)c1ccncc1)O[U]15(=O)(=O)(O3)[O]=C(c3ccc(cc3)C[n+]3ccc(cc3)c3ccncc3)O1)[OH2])[OH2])C%14C%15%20)C%16C%17%19)(OC(c1ccc(cc1)C[n+]1ccc(cc1)c1ccncc1)=[O]2)[O]=C(c1ccc(cc1)C[n+]1ccc(cc1)c1ccncc1)O4)[OH2].C1(=O)N2CN3C(=O)N4CN5C(=O)N6CN7C(=O)N8CN9C(=O)N%10CN%11C(=O)N%12CN%13C(=O)N%14CN%15C(=O)N%16CN1C1N%17CN%18C(=O)N(CN%19C(=O)N(CN%20C(=O)N(CN%21C(=O)N(CN%22C(=O)N(CN%23C(=O)N(CN%24C(=O)N(CN(C%17=O)C21)C3C4%24)C5C6%23)C7C8%22)C9C%10%21)C%11C%12%20)C%13C%14%19)C%15C%16%18 |
| Title of publication | Colossal negative thermal expansion in a cucurbit[8]uril-enabled uranyl-organic polythreading framework <i>via</i> thermally induced relaxation. |
| Authors of publication | Jin, Qiu-Yan; Liang, Yuan-Yuan; Zhang, Zhi-Hui; Meng, Liao; Geng, Jun-Shan; Hu, Kong-Qiu; Yu, Ji-Pan; Chai, Zhi-Fang; Mei, Lei; Shi, Wei-Qun |
| Journal of publication | Chemical science |
| Year of publication | 2023 |
| Journal volume | 14 |
| Journal issue | 23 |
| Pages of publication | 6330 - 6340 |
| a | 50.254 ± 0.003 Å |
| b | 17.1723 ± 0.0012 Å |
| c | 36.173 ± 0.002 Å |
| α | 90° |
| β | 126.907 ± 0.002° |
| γ | 90° |
| Cell volume | 24961 ± 3 Å3 |
| Cell temperature | 280 ± 2 K |
| Ambient diffraction temperature | 280 K |
| Number of distinct elements | 5 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | C 1 2/c 1 |
| Hall space group symbol | -C 2yc |
| Residual factor for all reflections | 0.1022 |
| Residual factor for significantly intense reflections | 0.0633 |
| Weighted residual factors for significantly intense reflections | 0.1525 |
| Weighted residual factors for all reflections included in the refinement | 0.1742 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.013 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/1569148.html
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