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Information card for entry 1571550
Preview
| Coordinates | 1571550.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C26 H44 N2 O4 S3 |
|---|---|
| Calculated formula | C26 H44 N2 O4 S3 |
| SMILES | S(SSN1C(CC(OC(=O)C(=C)C)CC1(C)C)(C)C)N1C(CC(OC(=O)C(=C)C)CC1(C)C)(C)C |
| Title of publication | BiTEMPS methacrylate dynamic covalent cross-linker providing rapid reprocessability and extrudability of covalent adaptable networks: high-yield synthesis with strong selectivity for disulfide linkages |
| Authors of publication | Debsharma, Tapas; Purwanto, Nathan S.; Fenimore, Logan M.; Mitchell, Sarah; Kennedy, Jayme; Torkelson, John M. |
| Journal of publication | Polymer Chemistry |
| Year of publication | 2024 |
| Journal volume | 15 |
| Journal issue | 21 |
| Pages of publication | 2167 - 2176 |
| a | 12.49888 ± 0.00012 Å |
| b | 12.16712 ± 0.00012 Å |
| c | 19.36765 ± 0.00017 Å |
| α | 90° |
| β | 91.5744 ± 0.0008° |
| γ | 90° |
| Cell volume | 2944.23 ± 0.05 Å3 |
| Cell temperature | 99.99 ± 0.13 K |
| Ambient diffraction temperature | 99.99 ± 0.13 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0316 |
| Residual factor for significantly intense reflections | 0.0299 |
| Weighted residual factors for significantly intense reflections | 0.0806 |
| Weighted residual factors for all reflections included in the refinement | 0.0818 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.078 |
| Diffraction radiation probe | x-ray |
| Diffraction radiation wavelength | 1.54184 Å |
| Diffraction radiation type | CuKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/1571550.html
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Users of the data should acknowledge the original authors of the
structural data.