Information card for entry 2005159
Chemical name |
Z-2-Phenyl-4-[(S)-2,2-dimethyl-1,3-dioxolan-4-ylmethylen]-5(4H)-oxazolone. |
Formula |
C15 H15 N O4 |
Calculated formula |
C15 H15 N O4 |
SMILES |
O1[C@@H](/C=C2\N=C(OC2=O)c2ccccc2)COC1(C)C |
Title of publication |
(<i>Z</i>)-4-[(<i>S</i>)-2,2-Dimethyl-1,3-dioxolan-4-ylmethylidene]-2-phenyl-1,3-oxazol-5(4<i>H</i>)-one |
Authors of publication |
Buñuel, E.; Cativiela, C.; Díaz-de-Villegas, M. D.; Gálvez, J. A.; Jiménez, A. I. |
Journal of publication |
Acta Crystallographica Section C |
Year of publication |
1996 |
Journal volume |
52 |
Journal issue |
7 |
Pages of publication |
1810 - 1813 |
a |
10.156 ± 0.001 Å |
b |
10.751 ± 0.002 Å |
c |
13.007 ± 0.002 Å |
α |
90° |
β |
90° |
γ |
90° |
Cell volume |
1420.2 ± 0.4 Å3 |
Cell temperature |
293 ± 2 K |
Ambient diffraction temperature |
293 ± 2 K |
Number of distinct elements |
4 |
Space group number |
19 |
Hermann-Mauguin space group symbol |
P 21 21 21 |
Hall space group symbol |
P 2ac 2ab |
Residual factor for all reflections |
0.0742 |
Residual factor for significantly intense reflections |
0.0483 |
Weighted residual factors for all reflections |
0.1561 |
Weighted residual factors for significantly intense reflections |
0.1363 |
Goodness-of-fit parameter for all reflections |
1.051 |
Goodness-of-fit parameter for significantly intense reflections |
1.086 |
Diffraction radiation wavelength |
0.71073 Å |
Diffraction radiation type |
MoKα |
Has coordinates |
Yes |
Has disorder |
No |
Has Fobs |
No |
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The link is:
https://www.crystallography.net/2005159.html