Information card for entry 2005631
| Chemical name |
1,3-bis(2,6-diisopropylphenyl)-2,2,4,4- tetramethyl-1,3,diaza-2,4-disilacyclobutane |
| Formula |
C28 H46 N2 Si2 |
| Calculated formula |
C28 H46 N2 Si2 |
| SMILES |
C[Si]1(C)N(c2c(cccc2C(C)C)C(C)C)[Si](C)(C)N1c1c(cccc1C(C)C)C(C)C |
| Title of publication |
1,3-Bis(2,6-diisopropylphenyl)-2,2,4,4-tetramethyl-1,3-diaza-2,4-disilacyclobutane |
| Authors of publication |
Shah, S. A. A.; Roesky, H. W.; Lubini, P.; Schmidt, H.-G. |
| Journal of publication |
Acta Crystallographica Section C |
| Year of publication |
1996 |
| Journal volume |
52 |
| Journal issue |
11 |
| Pages of publication |
2810 - 2811 |
| a |
9.7355 ± 0.0019 Å |
| b |
8.8451 ± 0.0018 Å |
| c |
16.594 ± 0.003 Å |
| α |
90° |
| β |
99.91 ± 0.03° |
| γ |
90° |
| Cell volume |
1407.6 ± 0.5 Å3 |
| Cell temperature |
150 ± 2 K |
| Ambient diffraction temperature |
150 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.0367 |
| Residual factor for significantly intense reflections |
0.0329 |
| Weighted residual factors for all reflections |
0.0897 |
| Weighted residual factors for significantly intense reflections |
0.0862 |
| Goodness-of-fit parameter for all reflections |
1.037 |
| Goodness-of-fit parameter for significantly intense reflections |
1.049 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/2005631.html