Information card for entry 2005787
| Chemical name |
ethyl 2-fluoro-2(p-toluoyl)-3-oxo-3-(p-tolyl)propanoate |
| Formula |
C20 H19 F O4 |
| Calculated formula |
C20 H19 F O4 |
| SMILES |
Cc1ccc(cc1)C(=O)C(C(=O)OCC)(C(=O)c1ccc(C)cc1)F |
| Title of publication |
Ethyl 2-Fluoro-3-oxo-2-(<i>p</i>-toluoyl)-3-(<i>p</i>-tolyl)propanoate, C~20~H~19~O~4~F |
| Authors of publication |
Kim, M.-J.; Shin, J.-C.; Lee, J.-H.; Rhie, D.-Y.; Kim, D.-Y.; Suh, I.-H.; Choi, S.-S.; Jensen, W. P.; Lewis, D. E. |
| Journal of publication |
Acta Crystallographica Section C |
| Year of publication |
1996 |
| Journal volume |
52 |
| Journal issue |
12 |
| Pages of publication |
3127 - 3128 |
| a |
14.79 ± 0.002 Å |
| b |
8.562 ± 0.0012 Å |
| c |
14.38 ± 0.003 Å |
| α |
90° |
| β |
98.853 ± 0.0013° |
| γ |
90° |
| Cell volume |
1799.3 ± 0.5 Å3 |
| Cell temperature |
298 K |
| Ambient diffraction temperature |
298 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.146 |
| Residual factor for significantly intense reflections |
0.0675 |
| Weighted residual factors for all reflections |
0.1321 |
| Weighted residual factors for significantly intense reflections |
0.1092 |
| Goodness-of-fit parameter for all reflections |
0.984 |
| Goodness-of-fit parameter for significantly intense reflections |
1.227 |
| Diffraction radiation wavelength |
0.71069 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/2005787.html