Information card for entry 2006980
| Chemical name |
(±)- 7,7,9,9-tetramethyl-2,3:4,5-di(naphtho)-1,6,8-trioxa- 7,9-disila-cyclonona-2,4-diene |
| Formula |
C24 H24 O3 Si2 |
| Calculated formula |
C24 H24 O3 Si2 |
| SMILES |
[Si]1(Oc2ccc3ccccc3c2c2c3ccccc3ccc2O[Si](O1)(C)C)(C)C |
| Title of publication |
(±)-7,7,9,9-Tetramethyl-2,3:4,5-dinaphtho-1,6,8-trioxa-7,9-disilacyclonona-2,4-diene |
| Authors of publication |
Qiancai Liu; Mengxian Ding; Yonghua Lin; Yan Xing |
| Journal of publication |
Acta Crystallographica Section C |
| Year of publication |
1998 |
| Journal volume |
54 |
| Journal issue |
1 |
| Pages of publication |
145 - 146 |
| a |
10.694 ± 0.001 Å |
| b |
13.481 ± 0.001 Å |
| c |
15.307 ± 0.002 Å |
| α |
90° |
| β |
94.32 ± 0.01° |
| γ |
90° |
| Cell volume |
2200.5 ± 0.4 Å3 |
| Cell temperature |
293 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.0713 |
| Residual factor for significantly intense reflections |
0.0404 |
| Weighted residual factors for all reflections |
0.1637 |
| Weighted residual factors for significantly intense reflections |
0.1217 |
| Goodness-of-fit parameter for all reflections |
0.489 |
| Goodness-of-fit parameter for significantly intense reflections |
0.479 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/2006980.html