Information card for entry 2008192
Chemical name |
1,3,5-tri-tertbutyldimethylsilyloxymethyl-2,4,6-triiodbenzene |
Formula |
C27 H51 I3 O3 Si3 |
Calculated formula |
C27 H51 I3 O3 Si3 |
SMILES |
Ic1c(c(I)c(c(I)c1CO[Si](C)(C)C(C)(C)C)CO[Si](C)(C)C(C)(C)C)CO[Si](C)(C)C(C)(C)C |
Title of publication |
2,4,6-Triiodo-1,3,5-tris(<i>tert</i>-butyldimethylsilyloxymethyl)benzene |
Authors of publication |
Løiten, Marianne Sveaas; Gløgård, Christian; Dalhus, Bjørn; Fjartoft, Berit; Klaveness, Jo |
Journal of publication |
Acta Crystallographica Section C |
Year of publication |
1999 |
Journal volume |
55 |
Journal issue |
2 |
Pages of publication |
IUC9900009 |
a |
12.8316 ± 0.0002 Å |
b |
13.5924 ± 0.0002 Å |
c |
23.8128 ± 0.0004 Å |
α |
79.5365 ± 0.0009° |
β |
88.225 ± 0.0008° |
γ |
63.4592 ± 0.0008° |
Cell volume |
3647.83 ± 0.1 Å3 |
Cell temperature |
150 ± 2 K |
Ambient diffraction temperature |
150 ± 2 K |
Number of distinct elements |
5 |
Space group number |
2 |
Hermann-Mauguin space group symbol |
P -1 |
Hall space group symbol |
-P 1 |
Residual factor for all reflections |
0.068 |
Residual factor for significantly intense reflections |
0.057 |
Weighted residual factors for all reflections |
0.151 |
Weighted residual factors for significantly intense reflections |
0.136 |
Goodness-of-fit parameter for all reflections |
1.997 |
Goodness-of-fit parameter for significantly intense reflections |
2.074 |
Diffraction radiation wavelength |
0.71073 Å |
Diffraction radiation type |
MoKα |
Has coordinates |
Yes |
Has disorder |
Yes |
Has Fobs |
No |
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The link is:
https://www.crystallography.net/2008192.html