Information card for entry 2012619
Common name |
3,4-(4-methoxybenzo):8,9-benzo-bicyclo[4.4.1]undeca-3,9-dien-11-one ethylene acetal |
Chemical name |
5-methoxyspiro[tetracyclo[8.8.1.0^3,8^.0^12,17^]nonadeca-3,5,7,12,14,16-hexene- 19,2'-[1,3]dioxolane] |
Formula |
C22 H24 O3 |
Calculated formula |
C22 H24 O3 |
SMILES |
c12cc(ccc1C[C@H]1Cc3c(C[C@@H](C2)C21OCCO2)cccc3)OC.c12cc(ccc1C[C@@H]1Cc3c(C[C@H](C2)C21OCCO2)cccc3)OC |
Title of publication |
3,4-(4-Methoxybenzo):8,9-benzobicyclo[4.4.1]undeca-3,8-dien-11-one ethylene acetal |
Authors of publication |
Liu, Xiaoming; Kilner, Colin A.; Halcrow, Malcolm A. |
Journal of publication |
Acta Crystallographica Section C |
Year of publication |
2002 |
Journal volume |
58 |
Journal issue |
4 |
Pages of publication |
o218 - o219 |
a |
13.3194 ± 0.0003 Å |
b |
7.7311 ± 0.0001 Å |
c |
16.5545 ± 0.0003 Å |
α |
90° |
β |
90° |
γ |
90° |
Cell volume |
1704.68 ± 0.05 Å3 |
Cell temperature |
150 ± 2 K |
Ambient diffraction temperature |
150 ± 2 K |
Number of distinct elements |
3 |
Space group number |
29 |
Hermann-Mauguin space group symbol |
P c a 21 |
Hall space group symbol |
P 2c -2ac |
Residual factor for all reflections |
0.0378 |
Residual factor for significantly intense reflections |
0.0338 |
Weighted residual factors for significantly intense reflections |
0.082 |
Weighted residual factors for all reflections included in the refinement |
0.0842 |
Goodness-of-fit parameter for all reflections included in the refinement |
1.051 |
Diffraction radiation wavelength |
0.71073 Å |
Diffraction radiation type |
MoKα |
Has coordinates |
Yes |
Has disorder |
No |
Has Fobs |
Yes |
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https://www.crystallography.net/2012619.html