Information card for entry 2013879
Chemical name |
[Benzylbis(dimethylamino)methylsilyl-κ^2^C,N](N,N,N',N'- tetramethylethylenediamine-κ^2^N,N)lithium(I) |
Formula |
C18 H37 Li N4 Si |
Calculated formula |
C18 H37 Li N4 Si |
SMILES |
[Li]12([N](C)(C)CC[N]1(C)C)C([Si]([N]2(C)C)(N(C)C)C)c1ccccc1 |
Title of publication |
[Benzylbis(dimethylamino)methylsilyl-κ^2^<i>C</i>,<i>N</i>](<i>N</i>,<i>N</i>,<i>N</i>',<i>N</i>'-tetramethylethylenediamine-κ^2^<i>N</i>,<i>N</i>)lithium(I) |
Authors of publication |
Shi, He-Ping; Liu, Dian-Sheng; Huang, Shu-Ping |
Journal of publication |
Acta Crystallographica Section C |
Year of publication |
2004 |
Journal volume |
60 |
Journal issue |
3 |
Pages of publication |
m107 - m109 |
a |
13.946 ± 0.004 Å |
b |
9.805 ± 0.002 Å |
c |
17.236 ± 0.004 Å |
α |
90° |
β |
112.523 ± 0.003° |
γ |
90° |
Cell volume |
2177.1 ± 0.9 Å3 |
Cell temperature |
183 ± 2 K |
Ambient diffraction temperature |
183 ± 2 K |
Number of distinct elements |
5 |
Space group number |
14 |
Hermann-Mauguin space group symbol |
P 1 21/c 1 |
Hall space group symbol |
-P 2ybc |
Residual factor for all reflections |
0.0853 |
Residual factor for significantly intense reflections |
0.06 |
Weighted residual factors for significantly intense reflections |
0.1228 |
Weighted residual factors for all reflections included in the refinement |
0.1336 |
Goodness-of-fit parameter for all reflections included in the refinement |
0.995 |
Diffraction radiation wavelength |
0.71073 Å |
Diffraction radiation type |
MoKα |
Has coordinates |
Yes |
Has disorder |
No |
Has Fobs |
Yes |
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https://www.crystallography.net/2013879.html