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Information card for entry 2017726
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Coordinates | 2017726.cif |
---|---|
Structure factors | 2017726.hkl |
Original IUCr paper | HTML |
Common name | di(4-ethylamino-3-nitrobenzene)sulfone |
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Chemical name | bis(4-ethylamino-3-nitrophenyl) sulfone |
Formula | C16 H18 N4 O6 S |
Calculated formula | C16 H18 N4 O6 S |
SMILES | S(=O)(=O)(c1cc(N(=O)=O)c(NCC)cc1)c1cc(N(=O)=O)c(NCC)cc1 |
Title of publication | <i>N</i>,<i>N</i>'-Diethyl-4-nitrobenzene-1,3-diamine, 2,6-bis(ethylamino)-3-nitrobenzonitrile and bis(4-ethylamino-3-nitrophenyl) sulfone |
Authors of publication | Payne, Thomas J.; Thurman, Chad R.; Yu, Hao; Sun, Qian; Mohanty, Dillip K.; Squattrito, Philip J.; Giolando, Mark-Robin; Brue, Christopher R.; Kirschbaum, Kristin |
Journal of publication | Acta Crystallographica Section C |
Year of publication | 2010 |
Journal volume | 66 |
Journal issue | 7 |
Pages of publication | o369 - o373 |
a | 15.514 ± 0.005 Å |
b | 8.573 ± 0.004 Å |
c | 15.012 ± 0.005 Å |
α | 90° |
β | 115.647 ± 0.012° |
γ | 90° |
Cell volume | 1799.9 ± 1.2 Å3 |
Cell temperature | 210 ± 1 K |
Ambient diffraction temperature | 210 ± 1 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0417 |
Residual factor for significantly intense reflections | 0.0339 |
Weighted residual factors for significantly intense reflections | 0.0903 |
Weighted residual factors for all reflections included in the refinement | 0.0951 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.024 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | Yes |
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The link is: https://www.crystallography.net/2017726.html
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Users of the data should acknowledge the original authors of the
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