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Information card for entry 2019046
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Jmol._Canvas2D (Jmol) "jmolApplet0"[x]
Coordinates | 2019046.cif |
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Structure factors | 2019046.hkl |
Original IUCr paper | HTML |
Chemical name | Triphenylsilanol‒4,4'-bipyridyl (4/1) |
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Formula | C82 H72 N2 O4 Si4 |
Calculated formula | C82 H72 N2 O4 Si4 |
SMILES | n1ccc(cc1)c1ccncc1.[Si](O)(c1ccccc1)(c1ccccc1)c1ccccc1.[Si](O)(c1ccccc1)(c1ccccc1)c1ccccc1.[Si](O)(c1ccccc1)(c1ccccc1)c1ccccc1.[Si](O)(c1ccccc1)(c1ccccc1)c1ccccc1 |
Title of publication | Triphenylsilanol‒4,4'-bipyridyl (4/1): the <i>Z</i>' = 4 polymorph revisited |
Authors of publication | Cascarano, Giovanni L.; Ferguson, George; Giacovazzo, Carmelo; Glidewell, Christopher; Spek, Anthony L. |
Journal of publication | Acta Crystallographica Section C |
Year of publication | 2013 |
Journal volume | 69 |
Journal issue | 7 |
Pages of publication | 774 - 777 |
a | 20.787 ± 0.004 Å |
b | 24.404 ± 0.005 Å |
c | 29.456 ± 0.006 Å |
α | 83.68 ± 0.03° |
β | 89.65 ± 0.03° |
γ | 67.11 ± 0.03° |
Cell volume | 13671 ± 6 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.2045 |
Residual factor for significantly intense reflections | 0.0632 |
Weighted residual factors for significantly intense reflections | 0.1349 |
Weighted residual factors for all reflections included in the refinement | 0.1876 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.921 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | Yes |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/2019046.html
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