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Information card for entry 2020462
Preview
Coordinates | 2020462.cif |
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Structure factors | 2020462.hkl |
Original IUCr paper | HTML |
Chemical name | (+)-2-({[(1<i>S</i>,2<i>S</i>,3<i>S</i>,5<i>R</i>)-2,6,6-Trimethylbicyclo[3.1.1]hept-3-yl]imino}methyl}naphthalene |
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Formula | C21 H25 N |
Calculated formula | C21 H25 N |
SMILES | N(=C\c1cc2ccccc2cc1)/[C@@H]1[C@H]([C@H]2C([C@@H](C1)C2)(C)C)C |
Title of publication | Crystal structures of ten enantiopure Schiff bases bearing a naphthyl group |
Authors of publication | Hernández-Téllez, Guadalupe; Moreno, Gloria E.; Bernès, Sylvain; Mendoza, Angel; Portillo, Oscar; Sharma, Pankaj; Gutiérrez, René |
Journal of publication | Acta Crystallographica Section E Crystallographic Communications |
Year of publication | 2016 |
Journal volume | 72 |
Journal issue | 4 |
Pages of publication | 583 |
a | 6.32427 ± 0.00018 Å |
b | 14.4559 ± 0.0003 Å |
c | 18.5421 ± 0.0005 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 1695.17 ± 0.08 Å3 |
Cell temperature | 150 ± 1 K |
Ambient diffraction temperature | 150 ± 1 K |
Number of distinct elements | 3 |
Space group number | 19 |
Hermann-Mauguin space group symbol | P 21 21 21 |
Hall space group symbol | P 2ac 2ab |
Residual factor for all reflections | 0.0526 |
Residual factor for significantly intense reflections | 0.0407 |
Weighted residual factors for significantly intense reflections | 0.0956 |
Weighted residual factors for all reflections included in the refinement | 0.1032 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.034 |
Diffraction radiation wavelength | 1.54184 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | Yes |
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