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Information card for entry 2022248
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Coordinates | 2022248.cif |
---|---|
Original IUCr paper | HTML |
Formula | Bi In0.14 Li2.56 |
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Calculated formula | Bi In0.14425 Li2.56325 |
Title of publication | Electronic stabilization by occupational disorder in the ternary bismuthide Li~3 -~ <i>~x~</i>~-~<i>~y~</i>In<i>~x~</i>Bi (<i>x</i> ≃0.14, <i>y</i> ≃0.29) |
Authors of publication | Ovchinnikov, Alexander; Bobev, Svilen |
Journal of publication | Acta Crystallographica, Section C |
Year of publication | 2020 |
Journal volume | 76 |
Journal issue | 6 |
Pages of publication | 585 - 590 |
a | 13.337 ± 0.004 Å |
b | 13.337 Å |
c | 13.337 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 2372.3 ± 0.7 Å3 |
Cell temperature | 200 ± 2 K |
Ambient diffraction temperature | 200 ± 2 K |
Number of distinct elements | 3 |
Space group number | 227 |
Hermann-Mauguin space group symbol | F d -3 m :2 |
Hall space group symbol | -F 4vw 2vw 3 |
Residual factor for all reflections | 0.0345 |
Residual factor for significantly intense reflections | 0.024 |
Weighted residual factors for significantly intense reflections | 0.0495 |
Weighted residual factors for all reflections included in the refinement | 0.0534 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.063 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/2022248.html
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