Information card for entry 2202081
| Chemical name |
[Dimethyl(dimethylamino)silicyl]benzyl-κ^2^C,N](N,N,N,N-tetramethylenediamine- κ^2^N,N)lithium(I) |
| Formula |
C17 H34 Li N3 Si |
| Calculated formula |
C17 H34 Li N3 Si |
| SMILES |
[Li]12([N](C)(C)CC[N]1(C)C)[N]([Si](C2c1ccccc1)(C)C)(C)C |
| Title of publication |
[Benzyldimethyl(dimethylamino)silyl-κ^2^<i>C,N</i>](<i>N,N,N,N</i>-tetramethylenediamine-κ^2^<i>N,N</i>)lithium(I) |
| Authors of publication |
He-Ping Shi; Dian-Sheng Liu; Shu-Ping Huang |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2003 |
| Journal volume |
59 |
| Journal issue |
6 |
| Pages of publication |
m319 - m321 |
| a |
8.533 ± 0.004 Å |
| b |
14.753 ± 0.006 Å |
| c |
16.241 ± 0.007 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
2044.5 ± 1.5 Å3 |
| Cell temperature |
183 ± 2 K |
| Ambient diffraction temperature |
183 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
19 |
| Hermann-Mauguin space group symbol |
P 21 21 21 |
| Hall space group symbol |
P 2ac 2ab |
| Residual factor for all reflections |
0.1656 |
| Residual factor for significantly intense reflections |
0.0765 |
| Weighted residual factors for significantly intense reflections |
0.0817 |
| Weighted residual factors for all reflections included in the refinement |
0.1037 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.834 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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https://www.crystallography.net/2202081.html