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Information card for entry 2203795
Preview
Coordinates | 2203795.cif |
---|---|
Structure factors | 2203795.hkl |
Original IUCr paper | HTML |
Formula | C36 H84 O18 Si6 Sn6 |
---|---|
Calculated formula | C36 H84 O18 Si6 Sn6 |
SMILES | C1(=[O][Sn]234(C[Si](C)(C)C)[O]5[Sn]67([O]2[Sn]25([O]3[Sn]35([O]2[Sn]28(C[Si](C)(C)C)([O]3[Sn]3([O]=C(C)O6)([O]72)(OC(=[O]8)C)C[Si](C)(C)C)[O]=C(C)O5)(OC(C)=[O]3)C[Si](C)(C)C)([O]=C(C)O4)C[Si](C)(C)C)(O1)C[Si](C)(C)C)C |
Title of publication | Hexameric trimethylsilylmethyloxotin acetate, [(Me~3~SiCH~2~)Sn(O)(OAc)]~6~ |
Authors of publication | Beckmann, Jens; Dakternieks, Dainis; Duthie, Andrew; Thompson, Laura; Tiekink, Edward R. T. |
Journal of publication | Acta Crystallographica Section E |
Year of publication | 2004 |
Journal volume | 60 |
Journal issue | 6 |
Pages of publication | m767 - m768 |
a | 13.8888 ± 0.0007 Å |
b | 18.8359 ± 0.0009 Å |
c | 13.9301 ± 0.0007 Å |
α | 90° |
β | 116.545 ± 0.001° |
γ | 90° |
Cell volume | 3260.1 ± 0.3 Å3 |
Cell temperature | 223 ± 2 K |
Ambient diffraction temperature | 223 ± 2 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.064 |
Residual factor for significantly intense reflections | 0.044 |
Weighted residual factors for significantly intense reflections | 0.086 |
Weighted residual factors for all reflections included in the refinement | 0.093 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.02 |
Diffraction radiation wavelength | 0.71069 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | Yes |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/2203795.html
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Users of the data should acknowledge the original authors of the
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